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2020-04-17 Lecture of Advanced Battery Material Industry | XPS Principle and Technical Features

Lecture of Advanced Battery Material Industry | XPS Principle and Technical Features



In recent years, science and technology are developed rapidly. Advanced surface analysis technology has become a necessary experimental technology for surface characteristics research in the fields of materials, energy, and catalysis, microelectronics, and semiconductor industries. As an important large-scale scientific instrument in the field of surface analysis, XPS can provide surface composition and chemical state information.  It is widely used in scientific research and high-tech industries and other fields which is important in solving complex problems.


At the invitation of Shenzhen International Graduate School of Tsinghua University, Dr. Ju Huanxin being a presenter in the Lecture of Advance Battery Material Industry and gave the first lesson about XPS. During the lesson, Dr. Ju explained the fundamental review and technologies features with applications. Also, he introduced the application of micro-focus scanning XPS in micro area analysis and depth analysis.



Testing Technology Center of Materials and Devices of Tsinghua Shenzhen International Graduate School (MDTC) was established in 2008. It was recognized by China National Accreditation Service for Conformity Assessment (CNAS) in 2013 and authorized by Canadian Standards Association (CSA) in 2016.MDTC is an important institution that provides notarization and authoritative testing data capabilities for scientific research and quality appraisal inside and outside the school. At present, MDTC has two major technology platforms: Material Testing and Analysis platform and Battery Testing platform. Each platform has completed testing equipment, with a total value of more than 100 million dollar.Scanning focused X-ray photoelectron spectroscopy from ULVAC-PHI is important equipment in the spectroscopy platform. The equipment not only meets the qualitative and quantitative analysis of the surface composition and valence state of materials and devices, but also achieve chemical state space imaging and in-depth analysis of multiple etching modes.



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