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2020-08-13 Research and Application of Quasi-in-situ/In-situ Analysis of X-ray Photoelectron Spectroscopy

  At the invitation of Prof. Jian Feng Wu, from school of Chemistry and Chemical Engineering, Lanzhou University, the online lecture on “Research and Application of Quasi-in-situ/In-situ Analysis of X-ray Photoelectron Spectroscopy” organized by PHI CHINA was successfully held on August 13th. X-ray photoelectron spectroscopy (XPS) is a widely used analysis technique by the detection of photoelectrons emitted from the surface of samples excited by X-ray. XPS can obtain the information on the composition and chemical state on the sample surface. Dr. Huanxin Ju systematically reported the latest development and application of XPS from three aspects: excitation X-ray source, sample environment and detection information:

 

  • The development of XPS based on high-energy X-ray not only realizes non-destructive depth analysis, but also provides more possibilities for in-situ experiments.
  • The development of ambient pressure XPS and the in-situ research on solid-gas interface and solid-liquid interface.
  • X-ray with small beam size provides the possibility for inhomogeneous samples and micro XPS analysis.
  • The combination of XPS and working environment (such as high temperature and high pressure, voltage, light, etc.) to realize testing under working conditions.
  • Comprehensive electronic structure information detection for characterization of semiconductor samples.
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