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Research and Application of Quasi-in-situ/In-situ Analysis of X-ray Photoelectron Spectroscopy

13 AUG 2020

At the invitation of Prof. Jian Feng Wu, from school of Chemistry and Chemical Engineering, Lanzhou University, the online lecture on “Research and Application of Quasi-in-situ/In-situ Analysis of X-ray Photoelectron Spectroscopy” organized by PHI CHINA was successfully held on August 13th. X-ray photoelectron spectroscopy (XPS) is a widely used analysis technique by the detection of photoelectrons emitted from the surface of samples excited by X-ray. XPS can obtain the information on the composition and chemical state on the sample surface. Dr. Huanxin Ju systematically reported the latest development and application of XPS from three aspects: excitation X-ray source, sample environment and detection information:

 

  • The development of XPS based on high-energy X-ray not only realizes non-destructive depth analysis, but also provides more possibilities for in-situ experiments.
  • The development of ambient pressure XPS and the in-situ research on solid-gas interface and solid-liquid interface.
  • X-ray with small beam size provides the possibility for inhomogeneous samples and micro XPS analysis.
  • The combination of XPS and working environment (such as high temperature and high pressure, voltage, light, etc.) to realize testing under working conditions.
  • Comprehensive electronic structure information detection for characterization of semiconductor samples.
 
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